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Hf0.5Zr0.5O2 film

Based on

4 Articles
2018 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

hafnium(IV) zirconium(IV) oxide

hafnium zirconium oxide
Type Single Compound
Formula Hf0.5Zr0.5O2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
double coercive field change

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Characterization

Method Nanomaterial Variant Source
grazing incidence X-ray and neutron diffraction

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • ethyl(methyl){tris[ethyl(methyl)amino]hafnio}amine
  • ozone
  • tetrakis(ethylmethylamido) zirconium
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Product

Hf0.5Zr0.5O2 film

Thickness: 8.8 - 9.6 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
See all (4)
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Product

Hf0.5Zr0.5O2 film

Thickness: 9.2 nm

Medium: none

Support: TiN/SiO2/Si substrate

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • ethyl(methyl){tris[ethyl(methyl)amino]hafnio}amine
  • ozone
  • tetrakis(ethylmethylamido) zirconium
  1. lJpnnA72qtum3i2D
Product

Hf0.5Zr0.5O2 film

Thickness: 9.2 nm

Medium/Support: none

References

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