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np+-Si/SiOx/NiFe nanocomposite material

Based on

1 Articles
2017 Most recent source

Composition

1

aluminium

aluminum
Type Single Compound
Formula Al
Role layer
2

phosphorus-doped n-type silicon wafer

np+-Si
Type Complex Compound
Formula
Role layer
3

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
4

silicon-rich silicon oxide

amorphous silicon suboxide amorphous silicon oxide silicon-rich oxide silicon suboxide amorphous SiOx silicon oxide a-SiOx glass SRSO SiOx SRO
Type Single Compound
Formula SiO(x)
Role layer
5

iron-nickel alloy

Type Complex Compound
Formula
Role layer
6

iron-nickel nanoparticles

NiFe nanoparticles iron-nickel NP NiFe NP Ni-FeNP
Type Nano Material
Formula
Role partial layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
charge transfer resistance

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Catalytic properties

Reaction Value Nanomaterial Variant Source
hydrogen peroxide oxidation

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Applications

Area Application Nanomaterial Variant Source
catalysis

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped n-type silicon wafer
  • air
Product

np+-Si/SiOx/NiFe nanocomposite material

Thickness: 200 nm

Thickness: 300 nm

Thickness: 450000 nm

Thickness: ~ 8 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped n-type silicon wafer
  • air
Product

np+-Si/SiOx/NiFe nanocomposite material

Thickness: 200 nm

Thickness: 300 nm

Thickness: 450000 nm

Thickness: ~ 8 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped n-type silicon wafer
  • air
Product

np+-Si/SiOx/NiFe nanocomposite material

Island size: ~ 15 nm

Island thickness: ~ 3 nm

Roughness: ~ 2.84 nm

Thickness: 200 nm

Thickness: 300 nm

Thickness: 450000 nm

Thickness: ~ 3 nm

Thickness: ~ 8 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • air
  • arsenic-doped n-type silicon wafer
Product

np+-Si/SiOx/NiFe nanocomposite material

Island size: ~ 15 nm

Island thickness: ~ 3 nm

Roughness: ~ 2.84 nm

Thickness: 200 nm

Thickness: 300 nm

Thickness: 450000 nm

Thickness: ~ 3 nm

Thickness: ~ 8 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped n-type silicon wafer
  • air
Product

np+-Si/SiOx/NiFe nanocomposite material

Thickness: 200 nm

Thickness: 300 nm

Thickness: 450000 nm

Thickness: ~ 8 nm

Medium/Support: none

References

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