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poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid methyl ester

P3HT:PCBM
Type Complex Compound
Formula
Role binder
2

hydrogen-passivated silicon nanocrystals

H-passivated Si nanocrystals H-passivated Si NC
Type Nano Material
Formula
Role fillers

Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Physical formation
Source:
  1. kkhdUSth6BTlcQHdc7rKVnCJlINi
  2. eiBePsK1Q
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

RMS roughness: 42.4 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
  1. 9w2GxomEF2KhPCS7DNZqUEhn223u
  2. IuKK6ZiwU
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

RMS roughness: 37.6 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
  1. 8XS3PhjjjvIJUp5CqGsKKyspSMND
  2. d2dHw37Y2
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

RMS roughness: 28.6 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
  1. HSs1gs8v7UDyjzAhF0HdbX8Mjh2H
  2. M9pwX8fkV
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

RMS roughness: 80.8 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
  1. LO1cqrp20dUn4JVxCkva89deI2fc
  2. b5s7JL6PW
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

Thickness: ~ 100 nm

Medium/Support: none

References

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