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poly(2-vinylpyridine)-block-polystyrene-block-poly(2-vinylpyridine)/patterned poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate)/patterned crosslinked polystyrene film/silicon

Based on

1 Articles
2016 Most recent source

Composition

1

silicon

Type Single Compound
Formula Si
Role layer
2

crosslinked polystyrene

XPS
Type Polymer
Formula
Role partial layer
3

poly(styrene-rand-2-vinylpyridine-rand-hydroxyethyl methacrylate) random copolymer

poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate) P(S-r-2VP-r-HEMA) random copolymer P(S-r-2VP-r-HEMA) brush P(S-r-2VP-r-HEMA)
Type Polymer
Formula
Role partial layer
4

poly(2-vinylpyridine)-block-polystyrene-block-poly(2-vinylpyridine)

P2VP-b-PS-b-P2VP triblock copolymer P2VP-b-PS-b-P2VP VSV-33
Type Polymer
Formula
Role layer

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. VLY0i8vpdrSMdZJBv7
Product

poly(2-vinylpyridine)-block-polystyrene-block-poly(2-vinylpyridine)/patterned poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate)/patterned crosslinked polystyrene film/silicon

Lamellar period: 16.3 nm

Line width: 19.1 nm

Periodicity: 65 nm

Thickness: 22 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. W7MrxiEDhg2vM7OQwZ
Product

poly(2-vinylpyridine)-block-polystyrene-block-poly(2-vinylpyridine)/patterned poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate)/patterned crosslinked polystyrene film/silicon

Lamellar period: 16.3 nm

Line width: 20.0 nm

Periodicity: 65 nm

Thickness: 22 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. XMWcHze7FlcjwcElsR
Product

poly(2-vinylpyridine)-block-polystyrene-block-poly(2-vinylpyridine)/patterned poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate)/patterned crosslinked polystyrene film/silicon

Lamellar period: 16.3 nm

Line width: 18.4 nm

Periodicity: 65 nm

Thickness: 22 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. 4GCMtTD3EneyVgcumh
Product

poly(2-vinylpyridine)-block-polystyrene-block-poly(2-vinylpyridine)/patterned poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate)/patterned crosslinked polystyrene film/silicon

Lamellar period: 16.3 nm

Line width: 22.0 nm

Periodicity: 65 nm

Thickness: 22 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  1. UzHhdX1t5uUyxLHuGP
Product

poly(2-vinylpyridine)-block-polystyrene-block-poly(2-vinylpyridine)/patterned poly(styrene-r-2-vinylpyridine-r-hydroxyethyl methacrylate)/patterned crosslinked polystyrene film/silicon

Lamellar period: 15.8 nm

Line width: 23.7 nm

Periodicity: 63 nm

Thickness: 22 nm

Thickness: 6 - 8 nm

Medium/Support: none

References

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