Loading ...

ZEP photoresist/crosslinked polystyrene film/silicon

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon

Type Single Compound
Formula Si
Role layer
2

crosslinked polystyrene

XPS
Type Polymer
Formula
Role partial layer
3

ZEP e-beam resist

ZEP 7000 ZEP
Type Complex Compound
Formula
Role layer

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

More information available to subscribers only.

Or, view sample content

Preparation

Method 1

Type: Chemical synthesis
Source:
  1. RQ7Bvk1VAAhjm7NKly4n
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 24.6 nm

Periodicity: 49 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
  1. LfSyCrZgIddRE3OcvwSK
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 24.75 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
  1. K1S9UsMXSkMTbp65GCeE
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 19.1 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
  1. kKiCtSBTIvPyqYeXaeMF
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 17.0 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
  1. bWHk67oIKW4nRsZwL2Ug
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 24 nm

Periodicity: 48 nm

Thickness: 6 - 8 nm

Medium/Support: none

References

Full content is available to subscribers only

To view content please choose from the following:


Sign up for a free trial