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ZEP photoresist/crosslinked polystyrene film/silicon

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon

Type Single Compound
Formula Si
Role layer
2

crosslinked polystyrene

XPS
Type Polymer
Formula
Role partial layer
3

ZEP e-beam resist

ZEP 7000 ZEP
Type Complex Compound
Formula
Role layer

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
  1. MPyMRCqWLyjHWpClgnDB
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 20.0 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
  1. Xg0FWYzyyLtSJE5GTLVX
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 23.7 nm

Periodicity: 63 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
  1. cTvvr7R0JAOW8gifwg1W
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 19.1 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
  1. Szzn1JW4Vp9p0gXFb7zg
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 24.6 nm

Periodicity: 49 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
  1. bZRW0nk67F1DnTVlO8Kn
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 18.4 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

References

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