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ZEP photoresist/crosslinked polystyrene film/silicon

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon

Type Single Compound
Formula Si
Role layer
2

crosslinked polystyrene

XPS
Type Polymer
Formula
Role partial layer
3

ZEP e-beam resist

ZEP 7000 ZEP
Type Complex Compound
Formula
Role layer

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
  1. zyI3xbNkHbwnLL0WXZgE
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 24.6 nm

Periodicity: 49 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
  1. sOmljM6BkNu1VkslHFII
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 24.75 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
  1. VXajnFj9ztoWDfsgwxta
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 19.1 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
  1. IBPVy33PffLiq1xDw8tp
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 17.0 nm

Periodicity: 65 nm

Thickness: 6 - 8 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
  1. e5dYIqJSKDfzjTHadZxR
Product

ZEP photoresist/crosslinked polystyrene film/silicon

Line width: 24 nm

Periodicity: 48 nm

Thickness: 6 - 8 nm

Medium/Support: none

References

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