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Ta/Cu/Co/Cu/Ta multi-layer film

Based on

2 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

tantalum

Type Single Compound
Formula Ta
Role layer
2

copper

Type Single Compound
Formula Cu
Role layer
3

fcc-cobalt

fcc cobalt fcc-Co cobalt
Type Single Compound
Formula Co
Role layer
4

copper

Type Single Compound
Formula Cu
Role layer
5

tantalum

Type Single Compound
Formula Ta
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
effective demagnetization field

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. nb86b9
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 5 nm

Thickness: ~ 50 nm

Medium: none

Support: Si wafer

Method 2

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. BjG5s2
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 5 nm

Thickness: ~ 40 nm

Medium: none

Support: Si wafer

Method 3

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. 5zshUk
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 5 nm

Thickness: ~ 30 nm

Medium: none

Support: Si wafer

Method 4

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. CS9Bsu
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 5 nm

Thickness: ~ 35 nm

Medium: none

Support: Si wafer

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • tantalum
  1. jBXc98gWVSekQfT0wf3WHLcq9Bh1
  2. dDLBQyD0fjlqnXAa
  3. 42G0Kq
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 3 nm

Thickness: ~ 3 nm

Medium/Support: none

References

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