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Ta/Cu/Co/Cu/Ta multi-layer film

Based on

2 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

tantalum

Type Single Compound
Formula Ta
Role layer
2

copper

Type Single Compound
Formula Cu
Role layer
3

cobalt

Type Single Compound
Formula Co
Role layer
4

copper

Type Single Compound
Formula Cu
Role layer
5

tantalum

Type Single Compound
Formula Ta
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
effective demagnetization field

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. c8rrqa
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 5 nm

Thickness: ~ 50 nm

Medium: none

Support: Si wafer

Method 2

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. aNpqhZ
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 5 nm

Thickness: ~ 40 nm

Medium: none

Support: Si wafer

Method 3

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. lQ3NmH
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 5 nm

Thickness: ~ 30 nm

Medium: none

Support: Si wafer

Method 4

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. XYm4KO
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 5 nm

Thickness: ~ 35 nm

Medium: none

Support: Si wafer

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • tantalum
  1. DEBKZSjVMlPsgTPSNs7Nh4mqkJdN
  2. 0JZAOMNCXhR1WfG5
  3. xjbPqo
Product

Ta/Cu/Co/Cu/Ta multi-layer film

Thickness: 3 nm

Thickness: ~ 3 nm

Medium/Support: none

References

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