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patterned photopolymer

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

AZ 9245 photoresist

photopolymer
Type Polymer
Formula
Role raw materials
2

poly(vinyl alcohol) phase mask

PVA phase mask
Type Nano Material
Formula
Role imprint/shape

Applications

Area Application Nanomaterial Variant Source
raw materials/precursors/templates

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • AZ 9245 photoresist
  1. lwqwDwubMTFoWV
  2. dQX2KfT2kV
  3. 8u2hNuKx180RsDJx3WX2A4m
Product

patterned photopolymer

Size: not specified

Medium/Support: none

References

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