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silicon dioxide-covered chromium interdigitated strip array on oxidized silicon

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

chromium

Type Single Compound
Formula Cr
Role partial layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer

Applications

Area Application Nanomaterial Variant Source
nanofluidics/microfluidics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • oxidized silicon
  1. wD16sS2rSKkQPx31dyGt7tx0jHDFlVKsuPTGY0Ix7FcVhAGNsGZ0D3IqCGbOqAI
Product

silicon dioxide-covered chromium interdigitated strip array on oxidized silicon

Interstrip gap: 40000 nm

RMS roughness: ~ 0.14 nm

Strip width: 80000 nm

Thickness: 100 nm

Thickness: 800 nm

Medium: none

Support: oxidized silicon

References

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