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ITO/HAT-CN/TAPC/POSTF: fac-(iprpmi)3/HAT-CN/Al nanostructured material

Based on

1 Articles
2015 Most recent source

Composition

1

tin-doped indium oxide

indium tin oxide ITO
Type Complex Compound
Formula
Role layer
2

dipyrazino [2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile

dipyrazino(2,3-f:2',3'-h)-quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,15-hexacarbonitrile dipyrazino[2,3-f:2',3'-h]quinozaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2'3'-h] quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2'3'-h]quinoxaline-2,3,6,7,10,11-hex acarbonitrile 1,4,5,8,9,12-hexaaza-triphenylene-2,3,6,7,10,11-hexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylene-2,3,6,7,10,11-hexacarbonitrile 1,4,5,8,9,12-hexaazatriphenylene-2,3,6,7,10,11-hexacarbonitrile 2,3,6,7,10,11-hexacyano-1,4,5,8,9,12-hexaazatriphenylene 1,4,5,8,9,11- hexaazatriphenylene hexacarbonitrile 1,4,5,8,9,12-hexaazatriphenylene-hexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylenehexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylenehexacabonitrile hexaazatriphenylene hexacarbonitrile hexaazatriphenylenehexacarbonitrile hexaazatriphenylenehexacabonitrile HAT(CN)6 HAT-CN HATCN HI-1 HAT
Type Single Compound
Formula C18N12
Role layer
3

4-{1-[4-(diphenylamino)phenyl]cyclohexyl}-N,N-diphenylaniline

1,1-bis[4-[N,N-di(p-tolyl)amino]phenyl]cyclohexane di-[4-(N,N-di-p-tolyl-amino)-phenyl]cyclohexane di-[4-(N,N-di-toylyl-amino)-phyenyl]cyclohexane di-[4-(N,N-ditolyl-amino)-phenyl]cyclohexane TAPC
Type Single Compound
Formula C42H38N2
Role layer
4

POSTF:FIrpic

Type Complex Compound
Formula
Role layer
5

dipyrazino [2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile

dipyrazino(2,3-f:2',3'-h)-quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,15-hexacarbonitrile dipyrazino[2,3-f:2',3'-h]quinozaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2'3'-h] quinoxaline-2,3,6,7,10,11-hexacarbonitrile dipyrazino[2,3-f:2'3'-h]quinoxaline-2,3,6,7,10,11-hex acarbonitrile 1,4,5,8,9,12-hexaaza-triphenylene-2,3,6,7,10,11-hexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylene-2,3,6,7,10,11-hexacarbonitrile 1,4,5,8,9,12-hexaazatriphenylene-2,3,6,7,10,11-hexacarbonitrile 2,3,6,7,10,11-hexacyano-1,4,5,8,9,12-hexaazatriphenylene 1,4,5,8,9,11- hexaazatriphenylene hexacarbonitrile 1,4,5,8,9,12-hexaazatriphenylene-hexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylenehexacarbonitrile 1,4,5,8,9,11-hexaazatriphenylenehexacabonitrile hexaazatriphenylene hexacarbonitrile hexaazatriphenylenehexacarbonitrile hexaazatriphenylenehexacabonitrile HAT(CN)6 HAT-CN HATCN HI-1 HAT
Type Single Compound
Formula C18N12
Role layer
6

aluminium

aluminum
Type Single Compound
Formula Al
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
current density

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • tin-doped indium oxide
  • dipyrazino [2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile
Product

ITO/HAT-CN/TAPC/POSTF: fac-(iprpmi)3/HAT-CN/Al nanostructured material

Thickness: 10 nm

Thickness: 40 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • dipyrazino [2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile
  • tin-doped indium oxide
Product

ITO/HAT-CN/TAPC/POSTF: fac-(iprpmi)3/HAT-CN/Al nanostructured material

Thickness: 10 nm

Thickness: 40 nm

Medium/Support: none

References

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