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BP flakes film

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon-rich silicon oxide

SRSO SiOx
Type Single Compound
Formula SiO(x)
Role layer
2

black phosphorus

phosphorus P black black P black-P b-P BP PB bP
Type Single Compound
Formula P
Role layer
3

substoichiometric aluminum oxide

noncrystalline aluminum oxide anodized aluminum oxide aluminium suboxide oxidized aluminium aluminium oxide aluminum oxide alumina
Type Single Compound
Formula AlO(x)
Role layer
4

NbV alloy

Type Complex Compound
Formula
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
elastic modulus

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Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
time-domain thermoreflectance

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. KFc2Rer
  2. rymHj3RYePG
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 193 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. 89V7zOQ
  2. s0jyel6Tz6d
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 552 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

Method 3

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. INOOhUa
  2. TgxQBJvF0wu
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 138 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. zy04dOG
  2. sS2yTx2A98q
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 404 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

Method 5

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. uec5yqV
  2. y8O58p62Irc
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 55 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

References

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