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silicon nanostructures

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

boron-doped silicon

B-doped Si
Type Complex Compound
Formula
Role raw materials
2

titanium

Type Single Compound
Formula Ti
Role partial layer
3

gold

Type Single Compound
Formula Au
Role layer

Applications

Area Application Nanomaterial Variant Source
analysis methods

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • boron-doped silicon
  1. DrK100DmTyXSTn
Product

silicon nanostructures

Line width: 100 nm

Thickness: 15 nm

Thickness: 2 nm

Trench depth: 6600 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • boron-doped silicon
  1. 0dMbDEGeNuuwRf
Product

silicon nanostructures

Grating width: 10000 nm

Line width: 125 nm

Thickness: 15 nm

Thickness: 2 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • boron-doped silicon
  1. Kert3qV5sOYmnP
Product

silicon nanostructures

Grating width: 10000 nm

Line width: 125 nm

Thickness: 15 nm

Thickness: 2 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • boron-doped silicon
  1. DXmrrEwlwYzULU
Product

silicon nanostructures

Line width: ~ 32 nm

Pattern diameter: 60000 nm

Thickness: 15 nm

Thickness: 2 nm

Trench depth: 2500 nm

Trench periodicity: 136 nm

Medium/Support: none

References

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