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polydimethylsiloxane nanopatterned film

Based on

29 Articles
2017 Most recent source

Composition

1

poly(dimethylsiloxane)

polydimethylsiloxane PDMS
Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
blue light extraction efficiency enhancement

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Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
sensor for Influenza A (HK68) virus

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Applications

Area Application Nanomaterial Variant Source
diagnostics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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scanning electron microscopy

Biological effects

Biological system Test details Nanomaterial Variant Source
GFP-expressing Escherichia coli

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • Sylgard 184 B
  • polydimethylsiloxane prepolymer
Product

polydimethylsiloxane nanopatterned film

Size: not specified

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • poly(dimethylsiloxane)
  • cross-linking agent
  1. nNSLpc5Eiz0r7aWXoO
Product

polydimethylsiloxane nanopatterned film

Well depth: ~ 100 nm

Well diameter: ~ 400 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Sylgard 184
  1. OjegCzv
  2. lGsS5wHOkIilmzKayYTVW6nnHCk7jkA6jmUEij4KZVPDClCHbUKxkfcUD
Product

polydimethylsiloxane nanopatterned film

Size: not specified

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Sylgard 184 curing agent
  • Sylgard 184 base
  1. LHMpPw
Product

polydimethylsiloxane nanopatterned film

Nano-ridge height: ~ 80 nm

Nano-ridge width: ~ 40 nm

Stripe depth: ~ 600 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • poly(dimethylsiloxane)
Product

polydimethylsiloxane nanopatterned film

Wrinkle height: ~ 70 nm

Wrinkle period: ~ 280 nm

Medium/Support: none

References

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