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[SiW12O40]4- immobilized on amine-modified silicon substrate

Based on

1 Articles
2011 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

-C15H32N2O

Type Single Compound
Formula -C15H32N2O
Role layer
2

dodecatungstosilicate polyoxometalate

silicotungstic acid anion [SiW12O40]4- STA anion
Type Single Compound
Formula SiW12O404-
Role layer

Applications

Area Application Nanomaterial Variant Source
electronics

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • 10-undecenoic fatty acid
Product

[SiW12O40]4- immobilized on amine-modified silicon substrate

Thickness: 2.9 nm

Thickness: ~ 1 nm

Medium: none

Support: silicon

References

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