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-CH3 terminated microstructured Si post

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

trimethoxypropylsilane moiety

Type Single Compound
Formula -C3H7O3Si-
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
1-butyl-3-methylimidazolium tetrafluoroborate adhesion force

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. yKjRzRLLGfJKk7ZOlOsLTHgk
Product

-CH3 terminated microstructured Si post

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. 2i9eEDAjgZDFDJU1OHLNsYUpNUWqO8ve6HbR
  2. uQaN9gJPlAvgslgbYbs9utq6
Product

-CH3 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 2000 nm

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. 9mjViuZuEje7jXlSLeDu5RIPmw1jts0P8nCX
  2. mnFiH0WNzXrQT9bFJxG96NHt
Product

-CH3 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 10000 nm

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. EQabSiZEh7wAARtUylq56Pv9EcY6SyCKA0Oi
  2. JhNzo1cYN1eZAQACOTlXivOR
Product

-CH3 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 30000 nm

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. PFbQSYbpDURdfgQkGLOBgFaspad05T4dWoU5
  2. Nvn90rgebMZVBV61XdNxyWWj
Product

-CH3 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 20000 nm

RMS roughness: 0.76 nm

Thickness: ~ 3.4 nm

Medium: none

Support: SiO2/Si

References

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