Loading ...

7,7'-[4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl]bis[6-fluoro-4-(5'-hexyl[2,2'-bithiophene]-5-yl)benzo[c][1,2,5]thiadiazole]:phenyl C71 butyric acid methyl ester blend film

Based on

12 Articles
2017 Most recent source

Composition

1

7,7'-(4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl)bis(6-fluoro-4-(5'-hexyl-[2,2'-bithiophene]-5-yl)benzo[c] [1,2,5]thiadiazole)

7,7'-(4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl)bis(6-fluoro-4-(5'-hexyl-[2,2'-bithiophen]-5-yl)benzo[c][1,2,5]thiadiazole) 7,7'-(4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl)bis(6-fluoro-4-(5'-hexyl-[2,2'-bithiophen]-5yl)-benzo[c][1,2,5]thiadiazole p-DTS(FBTTh2)2
Type Single Compound
Formula C64H72F2N4S8Si
Role raw materials
2

3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester

(6,6)-phenyl-C71-butyric acid methyl ester film [6,6]-phenyl-C71-butyric acid methyl ester film [6,6]-phenyl-C71-butyric acid methyl ester film [6,6]-phenyl C70-butyric acid methyl ester film (6,6)-phenyl-C71-butyric acid methyl ester [6,6]-phenyl-C71-butyric acid methyl ester [6,6]-phenyl C71 butyric acid methyl ester [6,6]-phenyl-C71-butyric acid methyl ester [6,6]-phenyl C71 butyric acid methyl ester phenyl-C71-butyric acid methyl ester phenyl C71 butyric acid methyl ester PC70BM monolayer PC71BM film PC71BM film [70]PCBM PC71BM PC71BM
Type Nano Material
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
activation energy

More information/entries available to subscribers only.

Or, view sample content

Applications

Area Application Nanomaterial Variant Source
power generation

More information available to subscribers only.

Or, view sample content

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

More information/entries available to subscribers only.

Or, view sample content

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • 4-[7,7-bis(2-ethylhexyl)-10-{5-fluoro-7-[5-(5-hexylthiophen-2-yl)thiophen-2-yl]-2,1,3-benzothiadiazol-4-yl}-3,11-dithia-7-silatricyclo[6.3.0.02,6]undeca-1(8),2(6),4,9-tetraen-4-yl]-5-fluoro-7-[5-(5-hexylthiophen-2-yl)thiophen-2-yl]-2,1,3-benzothiadiazole
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
  1. 5drr8ppc2UiAE4HLDqaTXlvF5LWA3oY7LCAW7bw
Product

7,7'-[4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl]bis[6-fluoro-4-(5'-hexyl[2,2'-bithiophene]-5-yl)benzo[c][1,2,5]thiadiazole]:phenyl C71 butyric acid methyl ester blend film

Size: not specified

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • 4-[7,7-bis(2-ethylhexyl)-10-{5-fluoro-7-[5-(5-hexylthiophen-2-yl)thiophen-2-yl]-2,1,3-benzothiadiazol-4-yl}-3,11-dithia-7-silatricyclo[6.3.0.02,6]undeca-1(8),2(6),4,9-tetraen-4-yl]-5-fluoro-7-[5-(5-hexylthiophen-2-yl)thiophen-2-yl]-2,1,3-benzothiadiazole
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
  1. KNfwmtKphSUwOTm808cS5SiGdgpN4GQaofGdt2m
Product

7,7'-[4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl]bis[6-fluoro-4-(5'-hexyl[2,2'-bithiophene]-5-yl)benzo[c][1,2,5]thiadiazole]:phenyl C71 butyric acid methyl ester blend film

Size: not specified

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • 4-[7,7-bis(2-ethylhexyl)-10-{5-fluoro-7-[5-(5-hexylthiophen-2-yl)thiophen-2-yl]-2,1,3-benzothiadiazol-4-yl}-3,11-dithia-7-silatricyclo[6.3.0.02,6]undeca-1(8),2(6),4,9-tetraen-4-yl]-5-fluoro-7-[5-(5-hexylthiophen-2-yl)thiophen-2-yl]-2,1,3-benzothiadiazole
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
  1. IW3S2eOU9mdBvQcrxegEokTm3W5YYWgnM6qfgSy
Product

7,7'-[4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl]bis[6-fluoro-4-(5'-hexyl[2,2'-bithiophene]-5-yl)benzo[c][1,2,5]thiadiazole]:phenyl C71 butyric acid methyl ester blend film

Size: not specified

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • 4-[7,7-bis(2-ethylhexyl)-10-{5-fluoro-7-[5-(5-hexylthiophen-2-yl)thiophen-2-yl]-2,1,3-benzothiadiazol-4-yl}-3,11-dithia-7-silatricyclo[6.3.0.02,6]undeca-1(8),2(6),4,9-tetraen-4-yl]-5-fluoro-7-[5-(5-hexylthiophen-2-yl)thiophen-2-yl]-2,1,3-benzothiadiazole
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
  1. YcI8mbEp9pjiw9FmtCht4bWpVXOVlQgUOiKqsmz
Product

7,7'-[4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl]bis[6-fluoro-4-(5'-hexyl[2,2'-bithiophene]-5-yl)benzo[c][1,2,5]thiadiazole]:phenyl C71 butyric acid methyl ester blend film

Size: not specified

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  1. 9PBuLwBDaHvleYthRy6kgZ
Product

7,7'-[4,4-bis(2-ethylhexyl)-4H-silolo[3,2-b:4,5-b']dithiophene-2,6-diyl]bis[6-fluoro-4-(5'-hexyl[2,2'-bithiophene]-5-yl)benzo[c][1,2,5]thiadiazole]:phenyl C71 butyric acid methyl ester blend film

Thickness: ~ 100 nm

Medium/Support: none

References

Full content is available to subscribers only

To view content please choose from the following:


Sign up for a free trial