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photoresist TF247 template

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

imprint resist FT247

photoresist FT247
Type Complex Compound
Formula
Role raw materials

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. Li3C0s0c9I2MgORWtfageQgOHRamQdf
  2. Dhj3ptRkrX9VWHjs
  3. 9y55
Product

photoresist TF247 template

Pitch: 50 nm

Spacing: 39 nm

Thickness: 8 nm

Width: 11 nm

Medium/Support: none

References

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