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poly(2,5-bis(4-octyltetradecyl)-3-(5-(tellurophen-2-yl)thieno[3,2-b]thiophen-2-yl)-6-(thieno[3,2-b]thiophen-2-yl)-2,5-dihydropyrrolo[3,4-c]pyrrole-1,4-dione)/[6,6]-phenyl-C71-butyric acid methyl ester blend

Based on

8 Articles
2015 Most recent source

Composition

1

poly(2,5-bis(4-octyltetradecyl)-3-(5-(tellurophen-2-yl)thieno[3,2-b]thiophen-2-yl)-6-(thieno[3,2-b]thiophen-2-yl)-2,5-dihydropyrrolo[3,4-c]pyrrole-1,4-dione)

Type Polymer
Formula
Role binder
2

[6,6]-phenyl-C71-butyric acid methyl ester

[6,6]-phenyl-C71-butyric acid methylester 6,6-phenyl-C71-butyric acid methyl ester PC70BM PC70BM
Type Nano Material
Formula
Role fillers

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electron mobility

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Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. UEa9CLG1vThI7VXFBfb2sRNDCKLrMHFpqJV5Qm2FGI
Product

poly(2,5-bis(4-octyltetradecyl)-3-(5-(tellurophen-2-yl)thieno[3,2-b]thiophen-2-yl)-6-(thieno[3,2-b]thiophen-2-yl)-2,5-dihydropyrrolo[3,4-c]pyrrole-1,4-dione)/[6,6]-phenyl-C71-butyric acid methyl ester blend

RMS roughness: 1.69 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  1. c2D6vV3
Product

poly(2,5-bis(4-octyltetradecyl)-3-(5-(tellurophen-2-yl)thieno[3,2-b]thiophen-2-yl)-6-(thieno[3,2-b]thiophen-2-yl)-2,5-dihydropyrrolo[3,4-c]pyrrole-1,4-dione)/[6,6]-phenyl-C71-butyric acid methyl ester blend

Roughness: 13.39 nm

Thickness: 190 - 210 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  1. 6srPhwUJyIFEQ54guhEyyxxE0aCOpbOgVImQ3C9P
Product

poly(2,5-bis(4-octyltetradecyl)-3-(5-(tellurophen-2-yl)thieno[3,2-b]thiophen-2-yl)-6-(thieno[3,2-b]thiophen-2-yl)-2,5-dihydropyrrolo[3,4-c]pyrrole-1,4-dione)/[6,6]-phenyl-C71-butyric acid methyl ester blend

RMS roughness: 2.31 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  1. gtjvLNHnpJGbJS4JV3WfKktMn3l36bWwBYjnJYBh
Product

poly(2,5-bis(4-octyltetradecyl)-3-(5-(tellurophen-2-yl)thieno[3,2-b]thiophen-2-yl)-6-(thieno[3,2-b]thiophen-2-yl)-2,5-dihydropyrrolo[3,4-c]pyrrole-1,4-dione)/[6,6]-phenyl-C71-butyric acid methyl ester blend

RMS roughness: 0.44 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  1. Qtl7F7VbMQCdZKa7ew6yx3CrkeYi1pd4d2n71x1P
Product

poly(2,5-bis(4-octyltetradecyl)-3-(5-(tellurophen-2-yl)thieno[3,2-b]thiophen-2-yl)-6-(thieno[3,2-b]thiophen-2-yl)-2,5-dihydropyrrolo[3,4-c]pyrrole-1,4-dione)/[6,6]-phenyl-C71-butyric acid methyl ester blend

RMS roughness: 2.47 nm

Medium/Support: none

References

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