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rolled-up silicon nitride bilayer nanostructures with full turn

Based on

1 Articles
2014 Most recent source

Composition

1

germanium buffer

germanium
Type Single Compound
Formula Ge
Role layer
2

silicon-rich silicon nitride

Si-reached silicon nitride silicon nitride a-SiNx SRSN
Type Single Compound
Formula SiN(x)
Role layer
3

silicon-rich silicon nitride

Si-reached silicon nitride silicon nitride a-SiNx SRSN
Type Single Compound
Formula SiN(x)
Role layer

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
  1. 2aTvx2IDuipT3UoAoYkRhxOwPqRXr
  2. XA0eU
Product

rolled-up silicon nitride bilayer nanostructures with full turn

Inner diameter: 19500 - 20400 nm

Thickness: 20 nm

Thickness: 62 nm

Thickness: 80 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Product

rolled-up silicon nitride bilayer nanostructures with full turn

Thickness: 120 nm

Thickness: 20 nm

Thickness: 93 nm

Medium: none

Support: silicon/silica

Method 3

Type: Physical formation
Source:
Product

rolled-up silicon nitride bilayer nanostructures with full turn

Thickness: 20 nm

Thickness: 62 nm

Thickness: 80 nm

Medium: none

Support: silicon/silica

Method 4

Type: Physical formation
Source:
Product

rolled-up silicon nitride bilayer nanostructures with full turn

Thickness: 20 nm

Thickness: 300 nm

Thickness: 400 nm

Medium: none

Support: silicon/silica

Method 5

Type: Chemical synthesis
Source:
  1. FDIC8pc7ZL75PSJnSXRuibWZMVALM
  2. pCq4l
Product

rolled-up silicon nitride bilayer nanostructures with full turn

Inner diameter: 100300 - 101000 nm

Thickness: 20 nm

Thickness: 300 nm

Thickness: 400 nm

Medium/Support: none

References

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