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Based on

148 Articles
1 Patents
2018 Most recent source

Composition

1

molybdenum(IV) sulfide

molybdenum disulphide molybdenum disulfide molybdenum sulfide
Type Single Compound
Formula MoS2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
band gap

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band structure plot
emission
water contact angle

Catalytic properties

Reaction Value Nanomaterial Variant Source
hydrogen evolution

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Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
compounds sensor for nitrogen dioxide

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Applications

Area Application Nanomaterial Variant Source
catalysis

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electronics
optoelectronics
power generation
sensors (excluding biosensors)

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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high-resolution transmission electron microscopy
optical microscopy
photoemission spectroscopy
photoluminescence
Raman spectroscopy
scanning electron microscopy
selected area electron diffraction
STEM-HAADF
transmission electron microscopy
UV
UV photoelectron spectroscopy
UV-Vis spectroscopy
UV-Vis-NIR optical spectroscopy
X-ray diffraction
X-ray photoelectron spectroscopy

Biological effects

Biological system Test details Nanomaterial Variant Source
breast cancer 159 cells

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicon/silica substrate
  • molybdenum
  1. hbhxggAPCgKFXvfSDg
Product

MoS2 film

Peak to valley roughness: 69.9 nm

Rms roughness: 0.25-1.41 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • diammonium tetrathiomolybdate
  • nickel
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  2. 4zvT5I8CtxczUU2LpdUD3AuNV4BZAzt
  3. Q8bzQYBkaDFoti
  4. 41Lj5J
Product

MoS2 film

Size: not specified

Medium: none

Support: nickel

Method 3

Type: Physical formation
Source:
Starting materials
Product

MoS2 film

Thickness: ~ 0.87 nm

Medium: none

Support: SiO2/Si

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • silicon/silica substrate
  • molybdenum
  1. mKHfy5iAKiAkJrwZXB
Product

MoS2 film

Rms roughness: 1.1 nm

Thickness: 3.1 nm

Medium: none

Support: silicon/silica substrate

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • molybdenum(IV) sulfide
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  2. crshHYyEFkJw4hDPdva6g3
Product

MoS2 film

Thickness: 2.5 nm

Medium: none

Support: silicon dioxide

References

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