Loading ...

germanium/HSQ prepattern/activated PS-b-P4VP film

Based on

1 Articles
2015 Most recent source

Composition

1

germanium

Type Single Compound
Formula Ge
Role layer
2

hydrogen silsesquioxane monomer

hydrogen silsesquioxane octasilsesquioxane XR-1541-002 XR-1541-4 XR-1541 Fox-16 FOx-16 HSQ
Type Single Compound
Formula H8O12Si8
Role layer
3

hydrogen silsesquioxane monomer

hydrogen silsesquioxane octasilsesquioxane XR-1541-002 XR-1541-4 XR-1541 Fox-16 FOx-16 HSQ
Type Single Compound
Formula H8O12Si8
Role partial layer
4

polystyrene

PS
Type Polymer
Formula
Role partial layer
5

poly(4-vinylpyridine)

P4VP
Type Polymer
Formula
Role layer

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

More information available to subscribers only.

Or, view sample content

Preparation

Method 1

Type: Chemical synthesis
Source:
  1. X730J3w
  2. SRVV
Product

germanium/HSQ prepattern/activated PS-b-P4VP film

Channel width: 224 nm

Cylinder size: 7.14 - 10.12 nm

Line width: 50 nm

Pitch: 30.35 - 34.55 nm

Thickness: ~ 60 nm

Medium: none

Support: SiO2/Si

Method 2

Type: Chemical synthesis
Source:
  1. 7LjnFF5
  2. hKgh
Product

germanium/HSQ prepattern/activated PS-b-P4VP film

Channel width: 265 nm

Cylinder size: 7.14 - 10.12 nm

Line width: 50 nm

Pitch: 30.35 - 34.55 nm

Thickness: ~ 60 nm

Medium: none

Support: SiO2/Si

Method 3

Type: Chemical synthesis
Source:
  1. DvrWL8l
  2. OzBp
Product

germanium/HSQ prepattern/activated PS-b-P4VP film

Channel width: 361 nm

Cylinder size: 7.14 - 10.12 nm

Line width: 50 nm

Pitch: 30.35 - 34.55 nm

Thickness: ~ 60 nm

Medium: none

Support: SiO2/Si

Method 4

Type: Chemical synthesis
Source:
  1. V8vYJFR
  2. z3G7
Product

germanium/HSQ prepattern/activated PS-b-P4VP film

Channel width: 326 nm

Cylinder size: 7.14 - 10.12 nm

Line width: 50 nm

Pitch: 30.35 - 34.55 nm

Thickness: ~ 60 nm

Medium: none

Support: SiO2/Si

Method 5

Type: Chemical synthesis
Source:
  1. 9MBs4wW
  2. Loeu
Product

germanium/HSQ prepattern/activated PS-b-P4VP film

Cylinder size: 7.14 - 10.12 nm

Line width: 50 nm

Pitch: 30.35 - 34.55 nm

Thickness: ~ 60 nm

Medium: none

Support: SiO2/Si

References

Full content is available to subscribers only

To view content please choose from the following:

We use cookies to improve your experience with our site. More information

Sign up for a free trial