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HSQ resist film

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

HSQ resist

Type Polymer
Formula
Role raw materials

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • p-type silicon with native oxide layer
  • HSQ resist
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Product

HSQ resist film

Thickness: 50 nm

Medium: none

Support: p-type silicon with native oxide layer

References

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