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line-space nanostructures

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

exposed HSQ photoresist

Type Complex Compound
Formula
Role raw materials

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. 0m9hYSHCHx39cmvLwTPWDPyPIWwDqiJd2PY6VaKb9oV2
Product

line-space nanostructures

Half-pitch: 15 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. 3HJmBGRRloUFSzGs53CuuWTA6btDoRNBju5p2yOG1Hzn
Product

line-space nanostructures

Half-pitch: 8 nm

Line gratings height: ~ 20 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. ROf6uW6DIfTPICGo4SAcvg0ylR6DnD41ZO6ib5gMAHki
Product

line-space nanostructures

Half-pitch: 16 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. WXshwsjS0aBb088Q86yG0FO2b98OXmVsmxRU6zAOYLOF
Product

line-space nanostructures

Half-pitch: 7 nm

Line gratings height: ~ 20 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  1. N2zWNM9NR70GVvl1zRL19CDvPByIgVqYTnfN1ixN5oAl
Product

line-space nanostructures

Half-pitch: 10 nm

Line gratings height: ~ 20 nm

Medium/Support: none

References

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