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line-space nanostructures

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

exposed HSQ photoresist

Type Complex Compound
Formula
Role raw materials

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. FBOg5FJvFH4GhOi8w3oyhYHaF5PKxciflzfIUgR7FOE4
Product

line-space nanostructures

Half-pitch: 25 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. YRCyccnG8hr2S5vd2UVy3XLV4eOdT5iPCyhQAAdy04Ya
Product

line-space nanostructures

Half-pitch: 23 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. gZa7togOXlgGvXxm9gfdRT3F949hv5j0XmZ8QDHvMsRx
Product

line-space nanostructures

Half-pitch: 8 nm

Line gratings height: ~ 20 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. PHurFIi3alS9J64RRUmPsqgeDjwoBTto2H65CEchsKFh
Product

line-space nanostructures

Half-pitch: 29 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  1. d38Mzp20UKXk56payo5tWjlnN6OvH2VSYAacRDjKTNVQ
Product

line-space nanostructures

Half-pitch: 9 nm

Line gratings height: ~ 20 nm

Medium/Support: none

References

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