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poly(styrene)-block-poly(methyl methacrylate) film on styrene-methyl methacrylate random copolymer brushes

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

styrene-methyl methacrylate random copolymer brushes

P(S-ran-MMA) brushes
Type Nano Material
Formula
Role raw materials
2

poly(styrene)-block-poly(methyl methacrylate) film

PS-b-PMMA film
Type Nano Material
Formula
Role layer

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon
  • poly(styrene-ran-methyl methacrylate)
  1. k8Kwd59OfllwQnM
  2. BmcdK9tM7wEA3ojaKLoV9rNgjR1OXESyU4C
Product

poly(styrene)-block-poly(methyl methacrylate) film on styrene-methyl methacrylate random copolymer brushes

Size: not specified

Medium: none

Support: silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • silicon
  • poly(styrene-ran-methyl methacrylate)
  1. TkHT8LEPiUYmXWa
  2. CcvYw0ID3KDUJVn1tH2pW6mqGCeIzZyTNMH
  3. zjTpyVD9iNZaK6MkY3yekskl
Product

poly(styrene)-block-poly(methyl methacrylate) film on styrene-methyl methacrylate random copolymer brushes

Stripe width: ~ 600 nm

Medium: none

Support: silicon

Method 3

Type: Physical formation
Source:
Starting materials
  • silicon
  • poly(styrene-ran-methyl methacrylate)
  1. gHYOt7zNFpwvDMW
  2. hOw8PRJ4mPsa9lMUXxXGL6rqTPHxFEFIdgz
Product

poly(styrene)-block-poly(methyl methacrylate) film on styrene-methyl methacrylate random copolymer brushes

Size: not specified

Medium: none

Support: silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • silicon
  • poly(styrene-ran-methyl methacrylate)
  1. HmA42N3c5dvMfdg
  2. SgKIN0Bdoufd0244eo1H8SCNXJAmF3LW9gr
  3. myoRojhZOjbpe2VIXrfmhIuG
Product

poly(styrene)-block-poly(methyl methacrylate) film on styrene-methyl methacrylate random copolymer brushes

Stripe width: ~ 800 nm

Medium: none

Support: silicon

Method 5

Type: Physical formation
Source:
Starting materials
  • silicon
  • poly(styrene-ran-methyl methacrylate)
  1. BI1g7vdIGy3b5fc
  2. 9gKKXC6kYP2jpKPdx8d8TnnGUwyd42vBIrl
  3. noZpNtKgW5jcftFCxAv7YNZOfN
Product

poly(styrene)-block-poly(methyl methacrylate) film on styrene-methyl methacrylate random copolymer brushes

Stripe width: ~ 1200 nm

Medium: none

Support: silicon

References

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