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line-space nanostructures

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon nitride

Type Single Compound
Formula Si3N4
Role layer
2

chromium

Type Single Compound
Formula Cr
Role partial layer
3

HfO-based photoresist

Inpria XE15IB Inpria resist Inpria IB Inpria IB
Type Complex Compound
Formula
Role layer

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. NWqiZ2ry4gyjUc5FpbwB8KrS6osYN
  2. 89mQWnYAbP39DjrLtq9t
Product

line-space nanostructures

Grating pitch: 40 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. iRN9VU0SDslCHJ65P0CQNBahgGrYn
  2. HEHR9o50re7VawGWaygU
Product

line-space nanostructures

Grating pitch: 36 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. bdYHGSQR0frRoWp8PdZeoTvaA3HIM
  2. AyZt6RTH3yvZ2XY3VRUj
Product

line-space nanostructures

Grating pitch: 32 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. b8T90nLubdtRFmnJN5rtSWoWg5Xwm
  2. L16aT6gzjkEshWiLCmKO
Product

line-space nanostructures

Grating pitch: 28 nm

Thickness: 100 nm

Thickness: 11 nm

Medium/Support: none

References

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