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high temperature gallium nitride film on molybdenum layer

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

molybdenum

Type Single Compound
Formula Mo
Role layer
2

gallium(III) nitride

Type Single Compound
Formula GaN
Role layer

Applications

Area Application Nanomaterial Variant Source
raw materials/precursors/templates

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • ammonia
  • trimethanidogallium
See all (4)
  1. 3b6XP0
  2. tp84dgSfdZ7fk
Product

high temperature gallium nitride film on molybdenum layer

Grain size: ~ 100 nm

Thickness: 250 - 300 nm

Medium: none

Support: SiO2/Si

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • ammonia
  • trimethanidogallium
See all (4)
  1. POYhn7
  2. qED6h1KQCl29T
Product

high temperature gallium nitride film on molybdenum layer

Grain size: ~ 100 nm

Grain size: ~ 200 - ~ 600 nm

Thickness: ~ 820 nm

Medium: none

Support: SiO2/Si

References

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