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Hf0.1Zr0.9O2 film

Based on

2 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

Hf0.1Zr0.9O2

Type Single Compound
Formula Hf0.1Zr0.9O2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
antiferroelectric

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Applications

Area Application Nanomaterial Variant Source
energy storage

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Characterization

Method Nanomaterial Variant Source
grazing incidence X-ray and neutron diffraction

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • ozone
  • tetrakis(ethylmethylamido) zirconium
  • ethyl(methyl)[tris[ethyl(methyl)amino]hafnio]amine
  1. e5SHGiO
Product

Hf0.1Zr0.9O2 film

Thickness: ~ 9.2 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • ozone
  • tetrakis(ethylmethylamido) zirconium
  • ethyl(methyl)[tris[ethyl(methyl)amino]hafnio]amine
Product

Hf0.1Zr0.9O2 film

Thickness: ~ 9.2 nm

Medium/Support: none

References

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