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tungsten selenide film

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

tungsten diselenide monolayer flakes

tungsten diselenide monolayer flakes tungsten diselenide monolayer tungsten selenide monolayer monolayered WSe2 nanosheets tungsten selenide flakes monolayer WSe2 flakes WSe2 monolayer flakes monolayer WSe2 flake monolayers of WSe2 single-layer WSe2 WSe2 monolayers WSe2 nanoflakes monolayer WSe2 flakes of WSe2 WSe2 flakes WSe2 ML
Type Nano Material
Formula
Role raw materials

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • tungsten(IV) selenide
Product

tungsten selenide film

Thickness: ~ 3.5 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • tungsten(IV) selenide
Product

tungsten selenide film

Thickness: ~ 2.1 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • tungsten(IV) selenide
Product

tungsten selenide film

Thickness: ~ 1.4 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • Si wafer
  • tungsten(IV) selenide
Product

tungsten selenide film

Size: not specified

Medium: none

Support: Si wafer

Method 5

Type: Physical formation
Source:
Starting materials
  • tungsten(IV) selenide
Product

tungsten selenide film

Thickness: ~ 0.7 nm

Medium/Support: none

References

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