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SU-8 nanopatterns

Based on

2 Articles
2015 Most recent source

Composition

1

SU-8 photoresist

SU-8
Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
haze

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Applications

Area Application Nanomaterial Variant Source
optoelectronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • soda-lime-silica glass
  • SU-8 photoresist
Product

SU-8 nanopatterns

Corrugation height: 10 - 110 nm

Corrugation width: 110 - 130 nm

Medium: none

Support: soda-lime-silica glass

Method 2

Type: Physical formation
Source:
Starting materials
  • soda-lime-silica glass
  • SU-8 photoresist
Product

SU-8 nanopatterns

Corrugation height: 10 - 80 nm

Corrugation width: 20 - 120 nm

Medium: none

Support: soda-lime-silica glass

Method 3

Type: Physical formation
Source:
Starting materials
  • soda-lime-silica glass
  • SU-8 photoresist
Product

SU-8 nanopatterns

Corrugation height: 20 - 180 nm

Corrugation width: 140 - 230 nm

Medium: none

Support: soda-lime-silica glass

Method 4

Type: Physical formation
Source:
Starting materials
  • SU-8 photoresist
Product

SU-8 nanopatterns

Line width: 71.5 - 77.3 nm

Medium: none

Support: silicon

Method 5

Type: Physical formation
Source:
Starting materials
  1. V0Q7KY
Product

SU-8 nanopatterns

Line width: 53.6 - 58.4 nm

Medium: none

Support: silicon

References

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