Loading ...

copper film on ruthenium substrate

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

ruthenium film on silicon

Type Nano Material
Formula
Role layer
2

copper

Type Single Compound
Formula Cu
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electrochemical stripping plot

More information/entries available to subscribers only.

Or, view sample content

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

More information/entries available to subscribers only.

Or, view sample content

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. ptIazRJKmcMHP3ftQQBr08Nun1D6YUS8
  2. u2aeEIFpPqi9ocmJYCbJmNI4u5bAwar9
  3. 5oiLX9p
  4. WPI
  5. UjAak
  6. xaEW
Product

copper film on ruthenium substrate

RMS roughness: 2.02 nm

Medium: none

Support: silicon

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. H0kEaqJbU2HED7Hb5NK0EgABVKOU58tz
  2. G00JmR6Xz0t8KO4zFc6VeLxXU7E
  3. 2XMD6Q6
  4. OCP
  5. OCXTx
  6. b2xG
Product

copper film on ruthenium substrate

RMS roughness: 2.02 nm

Medium: none

Support: silicon

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. 5MJkB3nAfegTSD0qyj4J3K5SjxT44kA2
  2. Ra86tsU9prQVyA5uL0mplGFkXSerPlCL
  3. eNwd4te
  4. DRc
  5. yOOJj
  6. l2A
Product

copper film on ruthenium substrate

RMS roughness: 1.76 nm

Thickness: 9.30 - 10.15 nm

Medium: none

Support: silicon

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. NnQTpaPR8kAQLdsUNxeLqsRDbDWJPNgx
  2. DoyNWdiPGajS83sjDUbHLHgVZv9
  3. ffEAbMr
  4. ps5
  5. Vimkb
  6. Urp
Product

copper film on ruthenium substrate

RMS roughness: 1.76 nm

Thickness: 9.30 - 10.15 nm

Medium: none

Support: silicon

Method 5

Type: Chemical synthesis
Source:
Starting materials
  1. eRpC0kNW4qEtvHqRUoBCs13nQQQiMLNG
  2. GjeOiCPpfAgQktIoHelvsX98gAzMyiKs
  3. iMsxBzJ
  4. 4O2
  5. pqg05
  6. JQa
Product

copper film on ruthenium substrate

RMS roughness: 2.65 nm

Thickness: 8.02 - 8.98 nm

Medium: none

Support: silicon

References

Full content is available to subscribers only

To view content please choose from the following:

We use cookies to improve your experience with our site. More information

Sign up for a free trial