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SixNy thin film

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon nitride

SixNy
Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
capacitance density dependent on sweep cycle number

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Applications

Area Application Nanomaterial Variant Source
data storage

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Characterization

Method Nanomaterial Variant Source
infrared spectroscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • octachlorotrisilane
  1. yGxvxlBUWpATp9fJGjTdlXxKZDee0uAC0mK3J
  2. lnXFO22GoKcEoMBdJYyMrFtBL1DzaUX
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 15 - 35 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • octachlorotrisilane
  1. E09KBvS4vWUhkELaIwl3pvATpk3TYk63EKYcb
  2. GRzyexAnuwMJ3VIr4T1N9TD9ZDvYtvu
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 15 - 35 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • ammonia
  • octachlorotrisilane
  1. anHiijWw7yfeoR2qf6Ql0lEW17wWK9H0bzf3p
  2. Xo48OX0qaRzAFz7SZGBkaxstakMsu12
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 24 nm

Medium: none

Support: SiO2/Si

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • octachlorotrisilane
  1. mbhf1K8iDxan5b85KrhQBJ83Qp0YIIlGVcakC
  2. 2UoWt9nFY2lxriAHvA2PYQC7nkfOTCz
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 15 - 35 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • ammonia
  • octachlorotrisilane
  1. t1l4Zat0XSBavjmJBWysZkX4QosPCh1MVrZbS
  2. qbhyFBQhQJ82NKmZgHmzZeWt4YyUQsH
Product

SixNy thin film

RMS roughness: < 0.3 nm

Thickness: 24 nm

Medium/Support: none

References

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