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buried Pb nanoislands in SiO2/Si interface

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon

Type Single Compound
Formula Si
Role layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
3

Pb nanoislands

Type Nano Material
Formula
Role layer

Characterization

Method Nanomaterial Variant Source
grazing incidence X-ray and neutron diffraction

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Preparation

Method 1

Type: Physical formation
Source:
  1. NvS9qyz5YEW
  2. fTEA0C
Product

buried Pb nanoislands in SiO2/Si interface

Incorporation depth: 1.5 - 3 nm

Radius of spherical part: ~ 3 - ~ 8 nm

Thickness: ~ 75 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • Si/SiO2
  • lead
  1. dyd1aKa
Product

buried Pb nanoislands in SiO2/Si interface

Incorporation depth: 1.5 - 3 nm

Radius of spherical part: ~ 3 - ~ 8 nm

Thickness: 200 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
  1. NSS0vKnRXtZ
  2. 1FBYAQ
Product

buried Pb nanoislands in SiO2/Si interface

Incorporation depth: 1.5 - 3 nm

Radius of spherical part: ~ 3 - ~ 8 nm

Thickness: ~ 29 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
  1. xyqi8gLsaU9
  2. YsLGr9
Product

buried Pb nanoislands in SiO2/Si interface

Incorporation depth: 1.5 - 3 nm

Radius of spherical part: ~ 3 - ~ 8 nm

Thickness: ~ 52 nm

Medium/Support: none

References

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