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hexaethylene glycol-grafted stacked high/low-density mesoporous boron-doped silicon

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

high/low-density mesoporous boron-doped silicon

Type Nano Material
Formula
Role layer
2

boron p-doped silicon

boron-doped silicon
Type Complex Compound
Formula
Role layer
3

-C23H46NO7

Type Single Compound
Formula -C23H46NO7
Role graft

Characterization

Method Nanomaterial Variant Source
UV

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. g0Fza0TSxA0KpNAOop5y
  2. RpN256sEhwpS6wKR1J9StswRSguG1QdBBPrz1Zm4IzTHGktFFFY5
Product

hexaethylene glycol-grafted stacked high/low-density mesoporous boron-doped silicon

Thickness: ~ 170 nm

Medium/Support: none

References

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