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polymer film

Based on

1 Patents
2014 Most recent source

Composition

1

poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4/styrene/styrene)

Type Polymer
Formula
Role raw materials
2

C30H31F6NO5S3

Type Single Compound
Formula C30H31F6NO5S3
Role raw materials
3

tetra-n-butylammonium hydroxide

tetra-n-butylammonium hydroxide tetrabutylammonium hydroxide tetrabutylammonium TBA hydroxide TBA-OH TBAOH TBAH TBA
Type Single Compound
Formula C16H36NOH
Role raw materials
4

3-hydroxy-2-naphthalene carboxylic acid

3-hydroxy-2-naphthalenic acid 3-hydroxy-2-naphthylic acid 2-hydroxy-3-naphthoic acid 3-hydroxy-2-naphthoic acid 3H2NCA
Type Single Compound
Formula C11H8O3
Role raw materials
5

polysiloxane KP-341

Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electron beam sensitivity

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Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • tetra-n-butylammonium hydroxide
  • poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4/styrene/styrene)
See all (5)
  1. 0tmylaDYANm1mtQqem5dzrgTwcg1KWuBKFuj9onzMeHHh3wzN5PGzVPLRMHS1aL
Product

polymer film

Thickness: 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • tetra-n-butylammonium hydroxide
  • poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4/styrene/styrene)
See all (5)
  1. bwXnyX5SW2TlITKo2gMKBm1txRAEXYFT7AoxbeUsVVRPEpzwRFvUD8ptM6ekqUe
Product

polymer film

Thickness: 50 nm

Medium/Support: none

References

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