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polymer film

Based on

1 Patents
2014 Most recent source

Composition

1

poly (4-hydroxystyrene/4-hydroxystyrene/C21H26O4/C21H26O4)

Type Polymer
Formula
Role raw materials
2

C24H15F5O3S2

Type Single Compound
Formula C24H15F5O3S2
Role raw materials
3

tetra-n-butylammonium hydroxide

tetra-n-butylammonium hydroxide tetrabutylammonium hydroxide tetrabutylammonium TBA hydroxide TBA-OH TBAOH TBAH TBA
Type Single Compound
Formula C16H36NOH
Role raw materials
4

C41H52O9

Type Single Compound
Formula C41H52O9
Role raw materials
5

C14H22O3

Type Single Compound
Formula C14H22O3
Role raw materials
6

3-hydroxy-2-naphthalene carboxylic acid

3-hydroxy-2-naphthalenic acid 3-hydroxy-2-naphthylic acid 2-hydroxy-3-naphthoic acid 3-hydroxy-2-naphthoic acid 3H2NCA
Type Single Compound
Formula C11H8O3
Role raw materials
7

polysiloxane KP-341

Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electron beam sensitivity

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Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • tetra-n-butylammonium hydroxide
  • 3-hydroxy-2-naphthalene carboxylic acid
See all (7)
  1. KDYjKEmm7fCMshOQaoOpEdKIvfgRKXF02jNdncKzzA2yS1nSnBWA6xr541ml0THwuRggXjxXnOHNNT8
Product

polymer film

Thickness: 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • polysiloxane KP-341
  • tetra-n-butylammonium hydroxide
  • 3-hydroxy-2-naphthalene carboxylic acid
See all (7)
  1. S3YdC0FFbV7uVba94c7lvz25UN16MJAS0Pfme2quEaxd1Zg1E18RmY8qcXLy2SMxh3wkPknmmbrnbaI
Product

polymer film

Thickness: 50 nm

Medium/Support: none

References

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