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amorphous silicon-coated boron-doped silicon film

Based on

1 Articles
2015 Most recent source

Composition

1

hydrogen-terminated amorphous silicon

a-Si:H
Type Complex Compound
Formula
Role layer
2

boron p-doped silicon

boron-doped silicon
Type Complex Compound
Formula
Role layer
3

n-doped silicon

Type Complex Compound
Formula
Role layer
4

boron p-doped silicon

boron-doped silicon
Type Complex Compound
Formula
Role layer
5

hydrogen-terminated amorphous silicon

a-Si:H
Type Complex Compound
Formula
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
effective charge carrier lifetime dependent on cleaning sequence

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Applications

Area Application Nanomaterial Variant Source
power generation

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • n-doped silicon
  • boron tribromide
  1. AJd4R
  2. HSnCV63
Product

amorphous silicon-coated boron-doped silicon film

Roughness: < 56 nm

Thickness: 10 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • n-doped silicon
  • boron tribromide
  1. moUhW
  2. ZuRKn3a
Product

amorphous silicon-coated boron-doped silicon film

Roughness: < 56 nm

Thickness: 10 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • n-doped silicon
  • boron tribromide
  1. Jfpwy
  2. mL9884i
Product

amorphous silicon-coated boron-doped silicon film

Roughness: < 56 nm

Thickness: 10 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • n-doped silicon
  • boron tribromide
  1. BaYSK
  2. b7pku04
Product

amorphous silicon-coated boron-doped silicon film

Roughness: < 56 nm

Thickness: 10 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • n-doped silicon
  • diborane
  • dichlorosilane
  1. IFFMO
Product

amorphous silicon-coated boron-doped silicon film

Roughness: < 5 nm

Thickness: 10 nm

Medium/Support: none

References

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