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AlN film grown on LSAT substrate

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

Vacuous

Type
Formula
Role layer
2

aluminium nitride

aluminum nitride
Type Single Compound
Formula AlN
Role layer

Characterization

Method Nanomaterial Variant Source
grazing incidence X-ray and neutron diffraction

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • aluminium nitride
  • lanthanum aluminate-strontium aluminium tantalate
  1. g8r13m
  2. ao2bcZ1R7nSoer568zGKzD
Product

AlN film grown on LSAT substrate

Thickness: 33 nm

Thickness: ~ 1.5 nm

Medium: none

Support: lanthanum aluminate-strontium aluminium tantalate

Method 2

Type: Physical formation
Source:
Starting materials
  • aluminium nitride
  • lanthanum aluminate-strontium aluminium tantalate
  1. bJ5z1n
  2. 64Pum5RK3bFeR6qpdM7ccn
Product

AlN film grown on LSAT substrate

Thickness: 1.2 nm

Thickness: 33 nm

Medium: none

Support: lanthanum aluminate-strontium aluminium tantalate

Method 3

Type: Physical formation
Source:
Starting materials
  • aluminium nitride
  • lanthanum aluminate-strontium aluminium tantalate
  1. FrIfTB
  2. XVywp6LvSU4AbUktEpayve
Product

AlN film grown on LSAT substrate

Thickness: 33 nm

Thickness: 5 nm

Medium: none

Support: lanthanum aluminate-strontium aluminium tantalate

Method 4

Type: Physical formation
Source:
Starting materials
  • aluminium nitride
  • lanthanum aluminate-strontium aluminium tantalate
  1. wKvf5f
  2. oMHIfgf9Ul0zdyZkYOy3v8
Product

AlN film grown on LSAT substrate

Thickness: 33 nm

Thickness: ~ 3 nm

Medium: none

Support: lanthanum aluminate-strontium aluminium tantalate

References

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