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SiO2/PS-OH/ZEP520

Based on

1 Articles
2013 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

SiOx substrates

SiOx substrates silicic oxide fused silica fused quartz SiO2 glass silica
Type Single Compound
Formula SiO2
Role layer
2

mono-hydroxyl-terminated polystyrene

PS-OH
Type Polymer
Formula
Role layer
3

poly(methyl-α-chloroacrylate-co-α-methylstyrene)

ZEP520
Type Polymer
Formula
Role layer

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. iE4Nz0Nvid7HsuB9svYP
Product

SiO2/PS-OH/ZEP520

Pattern pitch: 44.6 nm

Thickness: 2 - 3 nm

Thickness: 3 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  1. MYdViX9
Product

SiO2/PS-OH/ZEP520

Pattern pitch: 54 nm

Thickness: 3 nm

Thickness: 40 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  1. ogHJV44
Product

SiO2/PS-OH/ZEP520

Pattern pitch: 35.2 nm

Thickness: 3 nm

Thickness: 30 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  1. 7PPtR9UqPHDfLYR7MOSF
Product

SiO2/PS-OH/ZEP520

Pattern pitch: 31.4 nm

Thickness: 2 - 3 nm

Thickness: 3 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  1. lllCT5KmKXNPbOIjrVyz
Product

SiO2/PS-OH/ZEP520

Pattern pitch: 38.6 nm

Thickness: 2 - 3 nm

Thickness: 3 nm

Medium/Support: none

References

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