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μc-Si1-xGex:H/μc-Si0.9Ge0.1:H/μc-Si:H photoactive film

Based on

1 Articles
2012 Most recent source

Composition

1

microcrystalline hydrogenated silicon germanium

μc-SixGe1-x:H
Type Complex Compound
Formula
Role layer
2

microcrystalline hydrogenated silicon germanium

μc-Si0.9Ge0.1:H
Type Complex Compound
Formula
Role layer
3

microcrystalline hydrogenated silicon

μc-Si:H
Type Complex Compound
Formula
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
accepter-like Gaussian defect state

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Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
Raman spectroscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • germanium tetrahydride
  • silicon hydride
Product

μc-Si1-xGex:H/μc-Si0.9Ge0.1:H/μc-Si:H photoactive film

Thickness: 100 nm

Thickness: 75 nm

Medium/Support: none

References

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