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periodic nanopattern silicon heterojunction solar cell material

Based on

1 Articles
2014 Most recent source

Composition

1

crystalline silicon

silicon c-Si
Type Single Compound
Formula Si
Role layer
2

p-type a-silicon

p-type a-Si:H
Type Complex Compound
Formula
Role layer
3

tin-doped indium oxide

indium tin oxide ITO
Type Complex Compound
Formula
Role layer
4

oxygen

Type Single Compound
Formula O2
Role dopant
5

tin-doped indium oxide

indium tin oxide ITO
Type Complex Compound
Formula
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
reflectivity

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Characterization

Method Nanomaterial Variant Source
diffuse reflectance spectroscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
  1. dn
  2. prfvW
Product

periodic nanopattern silicon heterojunction solar cell material

Pattern depth: 550 nm

Pattern period: 550 nm

Thickness: 10 nm

Thickness: 20 nm

Thickness: 80 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
  1. Kk
  2. K4RNu
Product

periodic nanopattern silicon heterojunction solar cell material

Pattern depth: 370 nm

Pattern period: 550 nm

Thickness: 10 nm

Thickness: 20 nm

Thickness: 80 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
  1. ZP
  2. E6uVk
Product

periodic nanopattern silicon heterojunction solar cell material

Pattern depth: 270 nm

Pattern period: 550 nm

Thickness: 10 nm

Thickness: 20 nm

Thickness: 80 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
  1. mD
  2. EHwqM
Product

periodic nanopattern silicon heterojunction solar cell material

Pattern depth: 180 nm

Pattern period: 550 nm

Thickness: 10 nm

Thickness: 20 nm

Thickness: 80 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • crystalline silicon
  1. 1l
  2. pIQ7d
Product

periodic nanopattern silicon heterojunction solar cell material

Thickness: 10 nm

Thickness: 20 nm

Thickness: 80 nm

Medium/Support: none

References

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