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indium zinc oxide film

Based on

7 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

mixture of substance based on (zinc oxide (wurtzite)/zinc oxide (wurtzite)/indium sesquioxide/indium sesquioxide)

Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
activation energy for neutralization of ionized oxygen vacancies

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Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • indium(III) nitrate hydrate
  • hydrated zinc(II) nitrate
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Product

indium zinc oxide film

Thickness: 7 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • zinc nitrate hexahydrate
  • water
  • indium(III) nitrate hydrate
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Product

indium zinc oxide film

Thickness: ~ 10 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • water
  • diethylzinc
  • silicon wafer
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Product

indium zinc oxide film

Thickness: 40 - 50 nm

Medium: none

Support: silicon wafer

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • water
  • diethylzinc
  • silicon wafer
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Product

indium zinc oxide film

Thickness: 40 - 50 nm

Medium: none

Support: silicon wafer

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • water
  • diethylzinc
  • silicon wafer
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Product

indium zinc oxide film

Thickness: 40 - 50 nm

Medium: none

Support: silicon wafer

References

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