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Ti/fractured photoresist/SiO2 layer/Si

Based on

1 Articles
2012 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon

Type Single Compound
Formula Si
Role layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
3

photoresist

Type Polymer
Formula
Role partial layer
4

titanium

Type Single Compound
Formula Ti
Role layer

Preparation

Method 1

Type: Physical formation
Source:
  1. m4ZkKZ
Product

Ti/fractured photoresist/SiO2 layer/Si

Thickness: 100 nm

Thickness: 70 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
  1. cLkktd
Product

Ti/fractured photoresist/SiO2 layer/Si

Thickness: 100 nm

Medium/Support: none

References

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