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HfO2/amorphous indium gallium zinc oxide film

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

hafnium(IV) oxide

hafnium dioxide hafnium oxide hafnia
Type Single Compound
Formula HfO2
Role layer
2

amorphous indium gallium zinc oxide

a-IGZO
Type Complex Compound
Formula
Role layer

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • hafnium(IV) oxide
  1. eMLLo856nEabBaJ3eVXVkXONlkaaUZw
  2. RZ4ooroJ5uT6fxXGSD3qqfzTnWNEX
Product

HfO2/amorphous indium gallium zinc oxide film

RMS roughness: 0.579 nm

Thickness: 100 nm

Thickness: 30 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • hafnium(IV) oxide
  1. 5hcJttljy2YDB2hRf1i6Kf4ib9aQ9Pg
  2. DWBvx3LjlGosVEj8P4FH08y97ly9o
Product

HfO2/amorphous indium gallium zinc oxide film

RMS roughness: 1.179 nm

Thickness: 100 nm

Thickness: 30 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • hafnium(IV) oxide
  1. GX9hkTpVhmSeEJTviXegGHVzecGz68m
  2. r9r8TirmpXTJMEGd1Bby9SkMudiGB
Product

HfO2/amorphous indium gallium zinc oxide film

RMS roughness: 0.510 nm

Thickness: 100 nm

Thickness: 30 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • hafnium(IV) oxide
  1. CQPkWiygjaKI6QMwk0VE5z0aLQq0diF
  2. HeCzHRDkAbfR8Oi0XB2bJbA5tfaBG
Product

HfO2/amorphous indium gallium zinc oxide film

RMS roughness: 0.513 nm

Thickness: 100 nm

Thickness: 30 nm

Medium/Support: none

References

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