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SiOx film

Based on

2 Patents
2014 Most recent source

Composition

1

silicon-rich silicon oxide

SRSO SiOx
Type Single Compound
Formula SiO(x)
Role raw materials

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. HKgthq6WBklrDgnzDfKg9jEsZyuNnmCcuc8OG
Product

SiOx film

Pattern pitch: 46 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. vbmzOeUFEAz1DF9fTnb9g2B75Nf2uH399x9NW
Product

SiOx film

Pattern pitch: 33.3 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. BHBZCGvyzML0dgpxiOaB9z2SV2DbccfzQcX3z
Product

SiOx film

Pattern pitch: 32.6 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. 0uQ0T1yDK3lAaEGRWXMebtfHVv7AJnatW0UYq8NymKwhQ8tjwZcMQa9u3JTNS4Lk8mOBw1GHN
  2. mNVRqQ6U1VQnCOD2G1hdrTipRGUEFu4yRt8bv
Product

SiOx film

Pattern pitch: 41 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. ql9n2V26twHwbikikBHktVelhEChmRmbYA0IbuI80IwfY9B1DZXUJdYd90c8aSZlaQEc31UOK
  2. W0bC4o7ToN1WwOA66Cu5bRqdCxqsaIimdaPwj
Product

SiOx film

Pattern pitch: 38.3 nm

Medium/Support: none

References

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