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SiOx film

Based on

2 Patents
2014 Most recent source

Composition

1

silicon-rich silicon oxide

SRSO SiOx
Type Single Compound
Formula SiO(x)
Role raw materials

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. NBmdh4jY2lfvPOnFbZZS7A96djraXxWxpUD4F
Product

SiOx film

Pattern pitch: 46 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. lqD7gkJGJ2prWt0tH44kLw09rdkZstcSPYaYp
Product

SiOx film

Pattern pitch: 33.3 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. OrPlFXJzgI6m0SbLTNj55rzWzXqs9VRnj11pl
Product

SiOx film

Pattern pitch: 32.6 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. SSB9ISx6NROwPFrO4GQYj1dVXce3af5HbyjVaYN7Zj9oHHuXAtBvkCdOQ4tOid0ov0Kt2uOZ2
  2. LN7GC2IyeFijbU9rGFNhViWCzzBmqjfBaZC0O
Product

SiOx film

Pattern pitch: 41 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. DY2iv4T8jO7kFqM5JSc5n8o96IDlQkBjHefI5Je6S6OFPXUPPwKBlOglgm5fVyUoCkVSUtz9F
  2. YbAmlRM2iRghniOhqdcr9TB4PkNtueHGnwfa8
Product

SiOx film

Pattern pitch: 38.3 nm

Medium/Support: none

References

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