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SiOx film

Based on

2 Patents
2014 Most recent source

Composition

1

silicon-rich silicon oxide

SiOx SRSO
Type Single Compound
Formula SiO(x)
Role raw materials

Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. VLlE3oIeDberqqLoIJ4oCvDASpXx5DU9wPoSVzLz6vQ9WF4kc9oqRTU69M85VRjms9nP9voXb
  2. 84kdNpGWY2OEEPbjDgsvXploQsxkbyO665S2W
Product

SiOx film

Pattern pitch: 34.5 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. gZl4uGSxJgeDzMQJEumxZ4RmKX5RceKzNwmOU
Product

SiOx film

Pattern pitch: 33.3 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. EKHmK7U17tSPSYWJqns75xZrIRh8cUmF6B4JcNqt9nXzppZSJC5SvgoMRIhuRwAyO2HNIII2d
  2. BbDSo9mdlsNzpULjXba7shXyaW8WhBZN1LCLZ
Product

SiOx film

Pattern pitch: 28.4 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. EIojtE3no6q4Dr93EDGBHHHwryceRWnrBSv1Z
Product

SiOx film

Pattern pitch: 32.6 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • poly(styrene)-b-poly(siloxane)
  1. C8UuWTDCHcb5jIQmpWBGB2lZZxg1krcVEQgsJsDddP4SmY2dbIzHiOXnSMMVnW05rtSZbGMmm
  2. OUWOX6uDZaYHABUYLEufbCkYE0cDeofa08Blt
Product

SiOx film

Pattern pitch: 41 nm

Medium/Support: none

References

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