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SiO2-supported tetralayer polymer film

Based on

1 Patents
2013 Most recent source

Composition

1

poly (C18H22O4/C54H42O4)

Type Polymer
Formula
Role layer
2

phenylsesquisiloxane/methylsesquisiloxane/siloxane copolymer

Type Complex Compound
Formula
Role layer
3

poly (-C14H20O3-/-C16H24O2-/-C11H12O5-)

Type Polymer
Formula
Role layer
4

poly (-C10H12F6O3-/-C10H12F6O3-/-C13H18F6O3-/-C13H18F6O3-)

Type Polymer
Formula
Role layer

Applications

Area Application Nanomaterial Variant Source
electronics

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • poly (C18H22O4/C54H42O4)
  1. Fibb1JeZTQMczf11T0cSPiWk3zQiD17DXsvMEsxdCV88azl6UUQ3
Product

SiO2-supported tetralayer polymer film

Thickness: 100 nm

Thickness: 35 nm

Thickness: 50 nm

Medium: none

Support: silicon dioxide

References

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